발행물
컨퍼런스
제26회 한국반도체학술대회
2019
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Effects of Phosphorus Incorporation in Si Films : Structural, Electrical, and Bonding Characteristics
EMRS2018_fall
2018
Improved Growth and Film Properties of Plasma-Enhanced Atomic-Layer- Deposited Titanium Dioxide by Discrete Feeding Method
European Materials Research Society 2018 Fall Meeting
Insight into Strain and Chemical States in Heavily Phosphorus-Doped Epitaxial Si films
IUMRS-ICEM 2018
Selective Silicon Epitaxy via Plasma-Enhanced Chemical Vapor Deposition at Atmospheric Pressure
Simulation of Contact Resistivity Measurement in Highly Doped Silicon with Multi Line Transmission Line Model