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전체 논문

248

11

Super-conformal TiN thin film deposition by carrier pulse purge atomic layer deposition system: Chamber design optimization with computational fluid dynamics
Jeon, J., Park, H., 서동찬, 고대홍
Thin Solid Films, 2023

12

Morphology Transition of Te-doped InAs Nanowire on InP(111)B Grown Using MOCVD Method
DAE HONG KO,, SONG, C. H., Kong, M.;, Jang, H, Lee, S.T, Park, H.-H, Kim, D, Song, K, Shin, C.-S
Crystals, 2022

13

Low-Temperature Epitaxial Growth by Quiescent Plasma-Enhanced Chemical Vapor Deposition at Atmospheric Pressure
Song, CH, Ryu, HY, Oh, H, Baik, SJ, 고대홍
ECS Journal of Solid State Science and Technology, 2022

14

Selective Etching of Si versus Si1?xGex in Tetramethyl Ammonium Hydroxide Solutions with Surfactant
Choi, Yongjoon, Cho, Choonghee, Yoon, Dongmin, Kang, Joosung, Kim, Jihye, Kim, So Young, Suh, Dong Chan, Ko, Dae-hong
Materials, 2022

15

Lg = 50 nm Gate-All-Around In0.53Ga0.47As Nanosheet MOSFETs with Regrown In0.53Ga0.47As Contacts
Lee, I.-G, Jo, H.-B, Baek, J.-M, Lee, S.-T, Choi, S.-M, Kim, H.-J, Park, W.-S, Yoo, J.-H, Ko, D.-H, Kim, T.-W, Kim, S.-K, Kim, J.-G, Yun, J, Kim, T, Lee, J.-H, Shin, C.-S, Lee, J.-H, Seo, K.-S, Kim, D.-H
Electronics (Basel), 2022

16

Quantitative analysis of effect of dopant interaction on microstructural, physical, and electrical properties in laser-annealed SiGe:B:Ga film
Lee, K., Baik, S., Kang, J., Shin, H., Yoon, D., Kim, S., Moon, J., 서동찬, 고대홍
Thin Solid Films, 2022

17

Effect of Ge Concentration on the On-Current Boosting of Logic P-Type MOSFET with Sigma-Shaped Source/Drain
Ko, E, Lee, J, Ryu, SW, Shin, H, Park, S, 고대홍
Coatings, 2021

18

Epitaxial Growth of Si and SiGe Using High-Order Silanes without a Carrier Gas at Low Temperatures via UHVCVD and LPCVD
Byeon, DS, 조충희, 윤동민, 최용준, 이기석, 백승현, 고대홍
Coatings, 2021

19

High performance InGaAs channel MOSFETs on highly resistive InAlAs buffer layers
Lee, S.T., Lee, I.-G., Jang, H., Kong, M., Song, C., Kim, C.Z., Jung, S.H., Choi, Y., Kim, S., Eom, S.-K., Seo, K.-S., Kim, D.-H., 고대홍, Shin, C.-S.
SOLID-STATE ELECTRONICS, 2021

20

Defect reduction and dopant activation of in situ phosphorus-doped silicon on a (111) silicon substrate using nanosecond laser annealing
Shin, H, Lee, J, Ko, E, Kim, E, 고대홍
APPLIED PHYSICS EXPRESS, 2021