발행물
컨퍼런스
The 23rd Korean Conference on Semiconductors
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Preparation and Characterization of Ferroelectric Hf0.5Zr0.5O2 Films by RF-Sputtering Method
The 12th joint symposium on ferroelectrics
Characterization of Ferroelectric Hf0.5Zr0.5O2 Films by RF-sputtering Method
Study on the Two Step Polarization switching in Hf0.4Zr0.6O2 Thin Film Based on the First Order Phase Transition Theory
Ferroelectric Engineered HfO2 Films Induced by Gran Size Engineering through Atomic Layer Deposition Temperature Control
The 22nd Korean Conference on Semiconductors
Thin HfxZr1-xO2 Films (x=0.1-0.4) for a Monolithic Device for Various Energy-related Applications