발행물
컨퍼런스
MRS FALL MEETING & EXHIBIT, Boston, USA
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Ferroelectricity in HfO2-Based Films
HyMAP2014, Busan, Korea
Thin HfxZr1-xO2 Films: A New Lead-free Material for Electrostatic Supercapacitors
14th Annual Non-Volatile Memory Technology Symposium (NVMTS 2014), Jeju, Korea
Comparative study on the ferroelectric properties of thin Hf0.5Zr0.5O2 films on TiN and Ir electrodes
Incorporation of Al2O3 inter-layer to ferroelectric Hf0.5Zr0.5O2 films for controlling grain size and leakage current
JKCFE 10, Hiroshima, Japan
HfO2-based Ferroelectric Thin Films