발행물
컨퍼런스
Electroceramics XIV, Bucharest, Romania
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Ferroelectricity in HfO2-based films
MRS SPRING MEETING & EXHIBIT, San Francisco, California, USA
The origin of the ferroelectricity in thin Hf1-xZrxO2 films: microstructure and in-plane tensile stress formed during island coalescence
Grain size engineering for ferroelectric (Hf,Zr)O2 films by insertion of thin Al2O3 layer
The Effects of Evolution of Phases and Forming Gas Annealing on Ferroeletric Properties of Thin Hf0.5Zr0.5O2 Films
CECAM-Workshop Functional oxides for emerging technologies, Bremen University, Bremen, Germany
Nagative capacitance in ferroelectric oxides