,

Evolution of the Ferroelectricity in undoped HfO2 films through Deposition Temperature Control during Atomic Layer Deposition

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Analysis on the wake-up behavior of ferroelectric Hf0.5Zr0.5O2 films by pulse-switching measurement

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Carrier density control of 2-dimensional electron gas at a-Al2O3/SrTiO3 interface by ALD using O3 treatment

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The Ferroelectric and Antiferroelectric Properties of HfO2/ZrO2 Nanolaminate Systems

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An analysis for the wake-up phenomenon of ferroelectric Hf0.5Zr0.5O2 thin films by transient switching current