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21
Bonding strength evaluation of copper bonding using copper nitride layer
H. Park, H. Park, G. Kim, Y. B. Park, S. E. Kim
Microsystem Technologies, 2019
22
Nitrogen passivation formation on Cu surface by Ar–N2 plasma for Cu-to-Cu wafer stacking application
H. Park, S. E. Kim
Applied Sciences, 2019
23
Two-step plasma treatment on sputtered and electroplated Cu surfaces for Cu-to-Cu bonding application
H. Seo, H. Park, S. E. Kim
Microsystem Technologies, 2019
24
a treatment on sputtered and electroplated Cu surfaces for Cu-to-Cu bonding application
H.l Seo, H. Park, S. E. Kim
Microsystem Technologies, 2019
25
Process and characterization of photo-definable organic-inorganic dielectric for wafer level packaging
C. Song, S. E. Kim
J. Microelectron. & Packag. Soc., 2019
26
Analysis of Ar Plasma Effects for Copper Nitride Passivation Formation via Design of Experiment
C. Song, S. E. Kim
Microsystem Technologies, 2018
27
Nitrogen passivation formation on Cu surface by Ar-N2 plasma for Cu-to-Cu wafer stacking application
H. Park, S. E. Kim
Nanoscience and Nanotechnology Letters, 2018
28
Assessment of spin-on-glass for fan-out wafer level packaging with multilayer interconnects
C. Song, S. Kim, S. E. Kim
Advances in Materials, 2018
29
Fabrication of tin oxide thin film transistors by RF magnetron sputtering using Sn/SnO composite target
C. Kim, S. E. Kim
Proc. IEEE ECTC 2018 (Scopus), 2018
30
Fabrication and characteristics of spin-on dielectric for multi-level interconnect in WLP
C. Song, S. Kim, S. E. Kim
J. Microelectron. & Packag. Soc., 2018
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