Superior and stable ferroelectric properties of hafnium-zirconium-oxide thin films deposited via atomic layer deposition using cyclopentadienyl-based precursors without annealing

Effect of NH3 flow on electrical and mechanical properties of ALD TiN thin films

2D materials-based membranes for hydrogen purification: Current status and future prospects

Atomic layer deposited strontium niobate thin films as new high-k dielectrics

Low-resistivity SrRuO3 thin films formed on SiO2 substrates without buffer layer by RF magnetron sputtering

Effects of plasma conditions on sulfurization of MoO3 thin films and surface evolution for formation of MoS2 at low temperatures

Enhanced electrical properties of ZrO?inf?2?/inf?-TiN based capacitors by introducing ultrathin metal oxides

Growth characteristics of tin sulphides crystals by the vapour transport method using SnS and sulphur powders: effect of temperature and pressure

Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity

Highly transparent and conductive oxide-metal-oxide electrodes optimized at the percolation thickness of AgOx for transparent silicon thin-film solar cells