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61
Step Coverage Modeling of Thin Films in Atomic Layer Deposition
Ja-Yong Kim, Jin-Hyock Kim, Ji-Hoon Ahn, Sang-Won Kang*
Journal of Applied Physics, 2007
62
Protocol for lateral patterning of van der Waals heterostructures using sequential chemical vapor deposition
안지훈
STAR Protocols, 2025
63
High-Performance Negative Capacitance Field-Effect Transistors with Synthetic Monolayer MoS2
안지훈
ACS NANO, 2025
64
Unintended Soft Breakdown Mechanism Limiting Ultrathin Ferroelectric HZO Films Scaling
안지훈
ACS APPLIED ELECTRONIC MATERIALS, 2025
65
Molecular layer deposition of tin-based organic-inorganic hybrid films as photoresists
안지훈
APPLIED SURFACE SCIENCE, 2025
66
Polarization dynamics of the ferroelectric hafnium zirconium oxide thin-film capacitor during the relaxation process
안지훈
APPLIED PHYSICS LETTERS, 2025
67
Area-selective deposition of mos2 using self-assembled monolayers for high-precision patterning
안지훈
MATERIALS LETTERS, 2025
68
Effect of Al doping on structural and electrical properties of HfO2/ZrO2 layered structures for high-k applications
안지훈
JOURNAL OF ALLOYS AND COMPOUNDS, 2025
69
High-temperature atomic layer deposition of HfO2 film with low impurity using a novel Hf precursor
안지훈
JOURNAL OF MATERIALS CHEMISTRY C, 2025
70
Area-selective deposition of lateral van der Waals semiconductor heterostructures
안지훈
CELL REPORTS PHYSICAL SCIENCE, 2024
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