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Atomic-layer-deposited Li compound-based two-terminal artificial synapse devices

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Three-Dimensional Multi-Stacked Field-Effect Transistor Using Improved Two-Dimensional Electron Gas at the Interface of Al2O3/ZnO Ultra-Thin Film Heterostructures

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Controlled Growth Saturation Behavior of Ultrathin Ru Film Using Electric Field/Potential Assisted Atomic Layer Deposition (EA-ALD)

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Enhanced Selectivity of Atomic Layer Deposited Ru Thin Films through the Discrete Feeding of Aminosilane Inhibitor Molecules

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Atomic Layer Deposition of Metal Thin Film Using Discrete Feeding Method (DFM) and Electric Field/Potential Assisted-Atomic Layer Deposition (EA-ALD)