Reduction of Residual C and N-Related Impurities by Al(2)O(3) Insertion in Atomic-Layer-Deposited La(2)O(3) Thin Films
박태주, 김지영, Prasanna Sivasubrama, Brian Coss, Bongki Lee, Robert Wallace, Mike Riusseau, Xinye Liu, Huazhi Li, Jean-Sebastien Lehn, 홍대원, Deo Shenai
ELECTROCHEMICAL AND SOLID STATE LETTERS, 201103
163
Improved Growth and Electrical Properties of Atomic-Layer-Deposited Metal-Oxide Film by Discrete Feeding Method of Metal Precursor
박태주, 황철성, 김정환, 장재혁, 김언기, 이상영, 이주휘, 정형석
CHEMISTRY OF MATERIALS, 201103
164
Effects of O-3 and H2O oxidants on C and N-related impurities in atomic-layer-deposited La2O3 films observed by in situ x-ray photoelectron spectroscopy
박태주
APPLIED PHYSICS LETTERS, 201008
165
Optimized Electrical Properties and Chemical Structures of SrTiO3 Thin Films on Si Using Various Interfacial Barrier Layers
박태주
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 201008
166
Reduction of Electrical Defects in Atomic Layer Deposited HfO2 Films by Al Doping
박태주
CHEMISTRY OF MATERIALS, 201007
167
Reduced Metal Contamination in Atomic-Layer-Deposited HfO2 Films Grown on Si Using O-3 Oxidant Generated Without N-2 Assistance
박태주
ELECTROCHEMICAL AND SOLID STATE LETTERS, 201005
168
Improved properties of Pt-HfO2 gate insulator-ZnO semiconductor thin film structure by annealing of ZnO layer
박태주
THIN SOLID FILMS, 201004
169
Capacitance and Interface Analysis of Transparent Analog Capacitor Using Indium Tin Oxide Electrodes and High-k Dielectrics
박태주
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 201003
170
Effects of carbon on improved resistivity of low temperature chemical vapor deposited HfCN films