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Optimized Atomic Layer Deposition Process for SrTiO3 Thin Films with Sr(dmts)(hfac)2 and (CpMe5)Ti(OMe)3 for High-k Applications

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Achieving a High Dielectric Constant in TiO2 Thin Films by Controlling Stoichiometry and Crystallinity through Ozone Post-Treatment

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Improvement of Interfacial Electrical Properties of Au/ZrO2/Al2O3/TiN Capacitors by Reduction Effect of Ar Plasma Treatment

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Influence of Zr-Precursor Ligands on the Growth and Capacitor Properties of ZrO2 Thin Films Grown by ALD