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Effect of RF Sputtering Conditions of TiN Electrode on the Resistive Switching Characteristics of HfO2-Based RRAM Devices

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Atomic Layer Deposition of Molybdenum Oxide Thin Film Using Sequential H2 Reduction

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Analysis of Frequency-Dependent Dielectric Behavior in DRAM Capacitors

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Effect of Zr-Precursor Ligands Design on the Reactivity and Electrical Properties of ZrO2 Thin Films Grown by ALD

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High Mobility Oxide Semiconductor with Two-dimensional Electron Gas in Atomic Layer Deposited In2O3/Al2O3 Nanolaminate Structures