발행물
컨퍼런스
KCS 2025
2014.02
,
Annealing of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
현장우수포스터상
Optimization of Sputtering Process of TiN Thin Films for Use as a Capacitor Electrode
Enhancement of Dielectric Constant through Highly Stoichiometric TiO2 Thin Films Using Ozone Post-treatment
Synthesis of SrTiO3 Thin Films Using Atomic Layer Deposition with Sr(dmts)(hfac)2/Water and (CpMe5)Ti(OMe)3/Ozone on TiN Substrates
Mobility Improvement of Amorphous Insulator and Crystalline Semiconductor Nanolaminate Structure Grown by Atomic Layer Deposition