2026.01

,

Atomic Layer Deposition of Titanium Dioxides Thin Films Using New-Ti Precursor on Different Substrates

2026.01

,

Atomic Layer Deposition of In2O3with Different Temperatures for n-Type Oxide Semiconductors

2026.01

,

Suppression of the Floating Body Effect of the Double-Gate Transistor with the Buried Oxide Engineering Method

2026.01

,

Growth of in-situ Crystallized Rutile-TiO2 Thin Films on SnO2 layers

2026.01

,

Atomic Layer Deposition of TiO2 Thin Films Using a Novel Ti-precursor, CpTi(Oi Bu)3, for DRAM Capacitors on Various Substrates