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Characteristics of Indium Zinc Oxide Thin Films Deposited by Radio Frequency Reactive Magnetron Sputtering for Solar Cells Application

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Dry Etching of IZO Thin Films Using a HBr/Ar Plasma

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Dry Etching of Magnetic Tunnel Junction Stack Using a High Density Plasma of a Cl2/Ar Gas Mix

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The Effect on Electrical Property of Etched Magnetic Tunnel Junction Stack in Cl2/Ar and HBr/Ar Plasma

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Etch Characteristics of Magnetic Tunnel Junction Stack Using a High Density Plasma in a HBr/Ar Gas