발행물
컨퍼런스
한국공업화학회 춘계 정기총회 및 연구논문발표회
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C2F6/Ar 플라즈마를 이용한 IZO 박막의 건식 식각
HBr/Ar과 Cl2/Ar 플라즈마를 이용한 나노미터로 패턴된 Magnetic Tunnel Junction Stack의 건식 식각
Proceedings of International Symposium on Dry Process
Investigation on Etch Characteristics of Magnetic Tunnel Junction Stacks with Nanometer-Sized Patterns for Magnetic Random Access Memory
Inductively Coupled Plasma Reactive Ion Etching of ZnO in a HBr/Ar Plasma
Etch Characteristics of Nickel Oxide and Nickel Using Inductively Coupled Plasma Reactive Ion Etching for Oxide Resistive Random Access Memory(OxRRAM) Application