Inductively Coupled Plasma Etching of a Pb(ZrXTi1-X)O3 Thin Film in a HBr/Ar Plasma

Effect of etch gases on iridium etching using a hard mask

Etch Characteristics of Iridium in Chlorine-Containing and Fluorine-Containing Gas Plasmas

Etch Behavior of Pb(ZrXTi1-X)O3 Films Using a TiO2 Hard Mask

Etch Behavior of PZT films Using a TiO2 Hard Mask

Platinum etching by using a TiO2 hard mask in O2/Cl2/Ar plasma

Investigation of Preannealing Method for Preparation of Robust SrBi2Ta2O9 Thin Films by Chemical Solution Deposition

Fabrication and Characterization of MFISFET using CMOS Process for Single Transistor Memory Application

Effect of Pre-Annealing on Physical and Electrical Properties of SrBi2Ta2O9 Thin Films Prepared by Chemical Solution Deposition

Reactive Ion Etching of Pb(ZrXTi1-X)O3 Thin Films in an Inductively Coupled Plasma