Effect of Annealing Ferroelectric HfO2 Thin Films: In Situ, High Temperature X-Ray Diffraction
Park, MH (Park, Min Hyuk), Chung, CC (Chung, Ching-Chang), Schenk, T (Schenk, Tony), Richter, C (Richter, Claudia), Opsomer, K (Opsomer, Karl), Detavernier, C (Detavernier, C, Adelmann, C (Adelmann, Christo, Jones, JL (Jones, Jacob L.), Mikolajick, T (Mikolajick, Tho, Schroeder, U (Schroeder, Uwe)
ADVANCED ELECTRONIC MATERIALS, 201807