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전체 논문

291

281

Study of ferroelectric characteristics of Hf0.5Zr0.5O2 thin films grown on sputtered or atomic-layer-deposited TiN bottom electrodes
황철성, 김호현, 박민혁, 현승담, 박현우, 김범용, 이용빈, 김백수
APPLIED PHYSICS LETTERS, 202007

282

A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf<inf>0.5</inf>Zr<inf>0.5</inf>O<inf>2</inf> Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) Precursors
김백수, 현승담, 문태환, 김금도, 이영환, 박현우, 이용빈, 노장호, 김범용, 김호현, 황철성, 박민혁
NANOSCALE RESEARCH LETTERS, 202004

283

On the Origin of the Large Remanent Polarization in La:HfO<inf>2</inf>
Thomas Mikolajick, Jacob L. Jones, Claudia Richter, Uwe Schroeder, Tony schenk, 박민혁, Christopher Kuenneth, Alfred Kersch, Chris M. Fancher
ADVANCED ELECTRONIC MATERIALS, 201912

284

A comprehensive study on the mechanism of ferroelectric phase formation in hafnia-zirconia nanolaminates and superlattices
김금도, 최정혜, 문태환, 박재홍, 장혜정, 김한준, 현승담, 박민혁, 이영환, 황철성, 박현우, 김유진, 이광엽
APPLIED PHYSICS REVIEWS, 201911

285

Fluorite-structure antiferroelectrics
황철성, 박민혁
REPORTS ON PROGRESS IN PHYSICS, 201911

286

Understanding ferroelectric phase formation in doped HfO<inf>2</inf> thin films based on classical nucleation theory
박민혁, 황철성, 이영환
Nanoscale, 201911

287

Origin of Ferroelectric Phase in Undoped HfO2 Films Deposited by Sputtering
Monica Materano, Matteo Cavalieri, 박민혁, Uwe Schroeder, Thomas Mikolajick, Jacob L. Jones, Terence Mittmann, Martina Mueller, Ching-Chang Chung, Alfred Kersch, Chuanzhen Zhou, Thomas Szyjka, Patrick D. Lomenzo, Igor Stolichnov
ADVANCED MATERIALS INTERFACES, 201906

288

Transient Negative Capacitance Effect in Atomic-Layer-Deposited Al2O3 /Hf-0.3 Zr(0.7)O(2 )Bilayer Thin Film
김백수, 권영재, 이영환, 김한준, 박현우, 황철성, 문태환, 김금도, 이용빈, 김유진, 박민혁
ADVANCED FUNCTIONAL MATERIALS, 201904

289

Mitigating wakeup effect and improving endurance of ferroelectric HfO2-ZrO2 thin films by careful La-doping
Andrey M. Markeev, Evgeny V. Korostylev, Maxim G. Kozodaev, 황철성, Roman R. Khakimov, 박민혁, Anna G. Chernikova
JOURNAL OF APPLIED PHYSICS, 201901

290

La-doped Hf0.5Zr0.5O2 thin films for high-efficiency electrostatic supercapacitors
황철성, Anna G. Chernikova, Roman R. Khakimov, Maxim G. Kozodaev, Andrey M. Markeev, 박민혁
Applied Physics Letters 103(17), 201809