발행물
컨퍼런스
International Meeting on Infomation Display
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Direct Deposition of High Quality Microcrystalline Silicon Films by Catalytic CVD at Low Temperatures
9th Japan-Korea Joint Workshop on Advanced Semiconductor Processes and Equipments
Nonvolatile Memory Characteristics of a Doubly Stacked Si Nanocluster Floating Gate Memory
6th International Nanotech Symposium (Nano Korea 2008)
Control of Density and Size of Nano-crystals Embedded SiNx Film Prepared at a Low Temperature
Effective Synthesis and Purification of Single-Walled Carbon Nanotubes
Nanocrystalline Silicon Films Deposited with a Modulated Hydrogen Dilution Ratio by Catalytic CVD at 200℃