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컨퍼런스
10th International Meetings on Information Display
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Optical Sensitivity of P-I-N Diodes using Silicon Nano-Clusters Embedded in Silicon Rich Silicon Nitride Films
218th Electrochemical Society Meeting
Characteristics of Low-Temperature Cat-CVD Silicon Nitride Films Annealed In Situ with Atomic Hydrogen for Gate Dielectrics on Flexible Substrates
Characteristics of Silicon Nanocrystals Embedded in the Silicon Nitride Films Deposited by PECVD for Optoelectronics Applications
Structure Changes of Amorphous Silicon Carbide Films by Mixture Gas Ratio and Filament Temperature of Cat-CVD
Optical Sensitivity on Capacitance Characteristics of Silicon Rich Silicon Nitride Films Containing Silicon Nanocrystals Prepared by Cat-CVD