,

Influence of Low Temperature Annealing on Properties of Silicon-rich Silicon Nitride Films Prepared by Cat-CVD

,

Characteristic Analysis of Multifunctional SiNx:H Films at Low Temperatures (<150oC) by PECVD

,

Study of Silicon Nitride Films Fabricated at a Low Temperature by Cat-CVD for Gate Dielectric in Silicon Based TFTs

,

Characteristics of SiNx Gate Dielectric Layer for Silicon Based TFTs Fabricated at a Low Temperature Using Highly N2-diluted SiH4 gas by PECVD

,

Influence of Concentration of Silicon Nanocrystals on Properties of Silicon-Rich Silicon Nitride Films Prepared by Cat-CVD at Low Temperature