,

Study of Low Cost Dual-Select-Diode AMLCD Technology for Application to Pixel Switching or Light Emission Elements at Low Temperature (180oC)

,

Study of Filament Geometry for Large Area nc-Si TFTs Fabricated at Low Temperature(<100oC) by Cat-CVD on Flexible Substrates

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Photoconductivity Characteristics of Silicon Quantum Dots Embedded in Silicon-Rich Silicon Nitride Films Prepared by Cat-CVD

,

Study of Boron Doped Silicon Films Directly Deposited by Cat-CVD at Low Temperature (180oC) for Flexible Optoelectronic Devices

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SiOx Deposition by Prevention of the Filament Oxidation in Cat-CVD System