,

Effect of Nitridation Pretreatment on the Electrical Properties of Low-Temperature (100oC) Silicon Nitride Films

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Low Temperature Deposition of Boron Doped Silicon Thin Film for LED Device Study

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Mechanical and Electrical Properties of SiNx Films Fabricated Below 200oC with Highly Diluted Silane Gas by PE-CVD

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Characteristics of Low Temperature (100oC) Nanocrystalline Silicon for Active Layer of TFT Fabricated by Cat-CVD

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Characteristics of Silicon Nitride Films Deposited by Cat-CVD at a Low Temperature (100oC)