발행물
컨퍼런스
Materials Research Society Spring Meeting
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In-situ Hydrogen Annealing of Silicon Nitride Gate Dielectric Layers Prepared by Catalytic CVD for Minimizing Hysteresis
Electroluminescence Characteristics of Silicon Nanocrystals Embedded in Silicon Nitride Films Deposited at Low Temperature
제16회 한국반도체학술대회
Doubly Stacked Tunnel Barrier for Charge Storage Silicon Nanodots Embedded in a Silicon-rich Silicon Nitride
제36회 한국진공학회 동계정기학술대회
Formation of high density Si nanodots using sputtered silicon seeds for non-volatile memory applications
"Effect of Filament Temperature, Processing Pressure and CH4 Gas on Silicon-Carbide Films at Low Temperatures by Cat-CVD"