,

Characteristics of Silicon Nanocrystals Embedded in the Silicon Nitride Films Deposited by PECVD at a Low Temperature

,

Annealing Effect of Low Temperature (<150 C) Cat-CVD Gate Dielectric Silicon Nitride Films Diluted with Atomic Hydrogen

,

Photoconductivity in Silicon Rich Silicon Nitride Films Containing Silicon Nanocrystals Prepared by Catalytic CVD

,

Effect of Atomic in-situ Hydrogen Annealing for Gate Dielectric Cat-CVD Silicon Nitride Films on Flexible Substrate at temperature Below 200 C

,

Photoluminescence characteristics and chemical composition of SiNx:H films with various gas mixture ratio at low temperature