Distributed Ferromagnetic Inductively Coupled Plasma as an Alternative Plasma Processing Tool

On the E to H and H to E transition mechanisms in inductively coupled plasma

On the multistep ionizations in an argon inductively coupled plasma

Photoresist ashing technology using N2/O2 ferrite-core ICP in the dual damascene process

Effect of multistep ionizations on the electron temperature in an argon inductively coupled plasma