Effects of Work Function and Thermal Stability of Top Electrode Materials on Electrical Properties of ZrO2-Based DRAM Capacitors
김형준
Electron. Mater. Lett., 2025
12
Optimization of the Sputtering Process for TiN Thin Films as Electrodes in DRAM Capacitors
조석호
Ceramist, 2025
13
Improvement of Interfacial Electrical Properties of Au/ZrO2/Al2O3/TiN Capacitors by Reduction Effect of Ar Plasma Treatment
김형준
Ceramics Int., 2025
14
Improved resistive switching characteristics of Au/TiO2/Au memristors on PDMS substrates with pyramid arrays
이재준
Mater. Sci. Eng. B, 2025
15
Atomic Layer Etching of ZrO2 Thin Films for DRAM Capacitors Using NF3 Plasma and TiCl4
양하람
Ceram. Int., 2025
16
Atomic Layer Etching of ZrO2 Thin Films Using NF3 Plasma and TiCl4 for DRAM Capacitors
Haram Yang, Hyeongjun Kim, Seungmin Jo, Woongkyu Lee
Ceram. Int., 2025
17
Enhancement of electrical properties of morphotropic phase boundary in Hf1-xZrxO2 films by integrating Mo electrode and TiN interlayer for DRAM capacitors
Ju Yong Park, Hyojun Choi, Jaewook Lee, Kun Yang, Sun Young Lee, Dong In Han, Intak Jeon, Chang Hwa Jung, Hanjin Lim, Woongkyu Lee, Min Hyuk Park
Appl. Surf. Sci. Adv., 2025
18
Optimization of the Sputtering Process for TiN Thin Films as Electrodes in DRAM Capacitors
Seokho Cho, Woogkyu Lee
Ceramist, 2025
19
Enhancing Resistive Switching Properties of TiO2 Thin Films Grown by Atomic Layer Deposition through Pyramid-Structured PDMS Substrate.
이재준 석사과정
The AVS 24th International Conference on Atomic Layer Deposition (ALD 2024), 2024
20
Improvement of Interfacial Properties of ZrO2/Al2O3/TiN Capacitors Grown by Atomic Layer Deposition through Ar Plasma Treatment
김형준 석사과정
The AVS 24th International Conference on Atomic Layer Deposition (ALD 2024), 2024