Enhanced Brightness and Device Lifetime of Quantum Dot Light-Emitting Diodes by Atomic Layer Deposition
Gi-Hwan Kim, Kyeongchan Noh, Jisu Han, Minsu Kim, Nuri Oh, Woongkyu Lee, Hyon Bin Na, Chansun Shin, Tae-Sik Yoon, Jaehoon Lim, Seong-Yong Cho
Adv. Mater. Interfaces, 2020
42
CsPbBr3 Perovskite Quantum Dot Light-Emitting Diodes Using Atomic Layer Deposited Al2O3 and ZnO Interlayers
Hwang-Sik Yun, Kyeongchan Noh, Jigeon Kim, Sung Hoon Noh, Gi-Hwan Kim, Woongkyu Lee, Hyon Bin Na, Tae-Sik Yoon, Jaeyoung Jang, Younghoon Kim, Seong-Yong Cho
Phys. Status Solidi RRL, 2020
43
Leakage Current Control of SrTiO3 Thin Films through Al Doping at the Interface between Dielectric and Electrode Layers via Atomic Layer Deposition
이웅규
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2019
44
Substrate Effects on the Growth Behavior of Atomic-Layer-Deposited Ru Thin Films Using RuO4 Precursor and N-2/H-2 Mixed Gas
이웅규
JOURNAL OF PHYSICAL CHEMISTRY C, 2019
45
Substrate Effects on the Growth Behavior of Atomic-Layer-Deposited Ru Thin Films Using RuO4 Precursor and
이웅규, Sang Hyeon Kim, Dong Gun Kim, Dae Seon Kwon, Cheol Seong Hwang, Cheol Jin Cho, Cheol Hyun An, Woojin Jeon
J. Phys. Chem. C, 2019
46
Cs2SnI6-Encapsulated Multidye-Sensitized All-Solid-State Solar Cells
이웅규
ACS APPLIED MATERIALS & INTERFACES, 2019
47
Effect of the Annealing Temperature of the Seed Layer on the Following Main Layer in Atomic-Layer-Deposited SrTiO3 Thin Films
이웅규
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2019
48
Controlling the Electrical Characteristics of ZrO2/Al2O3/ZrO2 Capacitors by Adopting a Ru Top Electrode Grown via Atomic Layer Deposition
이웅규
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2019
49
Processing, Structure, and Transistor Performance: Combustion versus Pulsed Laser Growth of Amorphous Oxides
이웅규, Tobin J. Marks, Stephanie L. Moffitt, Robert P. H. Chang, Qing Ma, Michael J. Bedzyk, Katie L. Stallings, D. Bruce Buchholz, Binghao Wang, Allison F. Falduto
ACS Appl. Electron. Mater., 2019
50
Substrate Effects on the Growth Behavior of Atomic-Layer-Deposited Ru Thin Films Using RuO4 Precursor and N2/H2 Mixed Gas
Cheol Hyun An, Woojin Jeon, Sang Hyeon Kim, Cheol Jin Cho, Dae Seon Kwon, Dong Gun Kim, Woongkyu Lee, Cheol Seong Hwang