Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-Doped TiO2 Film
Jeon, W (Jeon, Woojin), Yoo, S (Yoo, Sijung), Kim, HK (Kim, Hyo Kyeom), Lee, W (Lee, Woongkyu), An, CH (An, Cheol Hyun), Chung, MJ (Chung, Min Jung), Cho, CJ (Cho, Cheol Jin), Kim, SK (Kim, Seong Keun), Hwang, CS (Hwang, Cheol Seong)
ACS APPLIED MATERIALS INTERFACES, 2014