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전체 논문

115

71

Reducing the nano-scale defect formation of atomic-layer-deposited SrTiO3 films by adjusting the cooling rate of the crystallization annealing of the seed layer
Woongkyu Lee, Sijung Yoo, Woojin Jeon, Yeon Woo Yoo, Cheol Hyun An, Min Jung Chung, Han Joon Kim, Sang Woon Lee, Cheol Seong Hwang
Thin Solid Films, 2015

72

Asymmetry in electrical properties of Al-doped TiO2 film with respect to bias voltage
Woojin Jeon, Sang Ho Rha, Woongkyu Lee, Cheol Hyun An, Min Jung Chung, Sang Hyun Kim, Cheol Jin Cho, Seong Keun Kim, Cheol Seong Hwang
Phys. Status Solidi RRL, 2015

73

Improved initial growth behavior of SrO and SrTiO3 films grown by atomic layer deposition with {Sr(demamp)(tmhd)}2 as Sr-precursor
Woongkyu Lee, Woojin Jeon, Cheol Hyun An, Min Jung Chung, Han Joon Kim, Taeyong Eom, Sheby Mary George, Bo Keun Park, Jeong Hwan Han, Chang Gyoun Kim, Taek-Mo Chung, Sang Woon Lee, Cheol Seong Hwang
Chem. Mater., 2015

74

Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-Doped TiO2 Film
Jeon, W (Jeon, Woojin), Yoo, S (Yoo, Sijung), Kim, HK (Kim, Hyo Kyeom), Lee, W (Lee, Woongkyu), An, CH (An, Cheol Hyun), Chung, MJ (Chung, Min Jung), Cho, CJ (Cho, Cheol Jin), Kim, SK (Kim, Seong Keun), Hwang, CS (Hwang, Cheol Seong)
ACS APPLIED MATERIALS INTERFACES, 2014

75

Structure and Electrical Properties of Al-Doped HfO2 and ZrO2 Films Grown via Atomic Layer Deposition on Mo Electrodes
Yoo, YW (Yoo, Yeon Woo), Jeon, W (Jeon, Woojin), Lee, W (Lee, Woongkyu), An, CH (An, Cheol Hyun), Kim, SK (Kim, Seong Keun), Hwang, CS (Hwang, Cheol Seong)
ACS APPLIED MATERIALS INTERFACES, 2014

76

Study on the degradation mechanism of the ferroelectric properties of thin Hf0.5Zr0.5O2 films on TiN and Ir electrodes
Park, MH (Park, Min Hyuk), Kim, HJ (Kim, Han Joon), Kim, YJ (Kim, Yu Jin), Lee, W (Lee, Woongkyu), Moon, T (Moon, Taehwan), Kim, KD (Kim, Keum Do), Hwang, CS (Hwang, Cheol Seong)
APPLIED PHYSICS LETTERS, 2014

77

Controlling the Al-doping profile and accompanying electrical properties of rutile-phased TiO2 thin films
Woojin Jeon, Sang Ho Rha, Woongkyu Lee, Yeon Woo Yoo, Cheol Hyun An, Kwang Hwan Jung, Seong Keun Kim, Cheol Seong Hwang
ACS Applied Materials and Interfaces, 2014

78

Nanoscale characterization of TiO2 films grown by atomic layer deposition on RuO2 electrodes
Katsuhisa Murakami, Mathias Rommel, Boris Hudec, Alica Rosová, Kristina Hušeková, Edmund Dobročka, Raul Rammula, Aarne Kasikov, Jeong Hwan Han, Woongkyu Lee, Seul Ji Song, Albena Paskaleva, Anton J. Bauer, Lothar Frey, Karol Fröhlich, Jaan Aarik, Cheol Seong Hwang
ACS Applied Materials and Interfaces, 2014

79

Chemistry of active oxygen in RuOx and its influence on the atomic layer deposition of TiO2 films
An, CH (An, Cheol Hyun), Han, JH (Han, Jeong Hwan), Hwang, CS (Hwang, Cheol Seong), Jeon, W (Jeon, Woojin), Kim, SK (Kim, Seong Keun), Lee, W (Lee, Woongkyu), Yoo, YW (Yoo, Yeon Woo)
JOURNAL OF MATERIALS CHEMISTRY C, 2014

80

Structure and electrical properties of Al-doped HfO2 and ZrO2 films grown via atomic layer deposition on Mo electrodes
Yeon Woo Yoo, Woojin Jeon, Woongkyu Lee, Cheol Hyun An, Seong Keun Kim, Cheol Seong Hwang
ACS Appl. Mater. Interfaces, 2014