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A study on measurement of the surface charge accumulation using anodic aluminum oxide template

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Real time monitoring of dielectric-film thickness on the surface of chamber wall for plasma processing

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Effect of Flow Rate on the Plasma Parameters in a Dual Type Inductively Coupled Plasma

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Correlation between electrical characteristics of RF bias and plasma parameters in biased inductively coupled plasmas

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E-H transition measurement in cylindrical ICP with external DC magnetic field