발행물
컨퍼런스
Korean International Semiconductor Conference on Manufacturing Technology 2023
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Inductively Coupled Plasma Reactive Ion Etching of Cobalt Thin Films Using Halogen Gas
High Density Plasma Reactive Ion Etching of Cobalt Thin Films Using CH3COCH3/Ar Plasma
The 30th Korean Conference on Semiconductors
Effective wet cleaning for removal of redeposited materials on dry-etched copper thin films
500nm-Line Etching of Cobalt Thin Films Using Organic Gas
Korean International semiconductor conference on manufacturing technology 2022
Dry etching of copper thin films using acetylacetone/O2/Ar plasma