발행물
컨퍼런스
19th International Conference on Atomic Layer Deposition
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Cyclic Etching of Copper Thin Films using Two Sequential Steps
Materials Research Society 2019 MRS Spring Meeting & Exhibit
Etch characteristics of cooper thin film using continuous-wave and pulse-modulated plasma of CH3COOH/Ar
제26회 한국반도체 학술대회
Inductively coupled plasma reactive ion etching of Cu thin film using plasma of organic compounds
Inductively Coupled Plasma Reactive Ion Etching of Copper Thin Films Using Carboxylic Acids
Influence of pulsed-modulated plasma on etch characteristics of copper thin films