발행물
컨퍼런스
233rd ECS meeting
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Etch characteristics of Cu thin film using inductively coupled plasma of non-greenhouse gases
Investigation on aerosol jet etching for thin film patterning
제25회 한국반도체 학술대회
Etch Characteristics of Nanometer-Scale Patterned Thin Film Using Aerosol Jet Etching System
Etch Characteristics of Micrometer-Scale Masked Cu thin films Using Inductively Coupled Plasma of H2/Ar
제25회 한국반도체학술대회
Inductively coupled plasma reactive ion etching of Cu thin film using O2/Ar plasma