,

Nanometer-scale Etch Characteristics of TiN Thin Films using Inductively Coupled Plasma of Cl2/C2F6/Ar

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Etch Characteristics of Magnetic Tunnel Junction Stacks using Pulse modulated RF Source Plasma

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Dry etching of nanometer-scale patterned CoFeB thin films under pulse modulated plasma

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Effect of Two-Step Deposition on CuInS2 Thin Films Prepared Using Aerosol Jet Deposition Method

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Characterization of Zn(O,S) buffer layers for Cu(In,Ga)Se2 solar cells