,

High density plasma reactive ion etching of Ru thin films using non-corrosive gas mixture

,

Influence of selenization process on Cu(InxGa1-x)Se2 absorber layer prepared by RF sputtering using single quaternary target

,

Inductive Couple Plasma Reactive Ion Etching characteristics of TiO2 thin films

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Dry Etching of Magnetic Tunnel Junctions Stacks using a H2O/CH3OH based inductively coupled Plasma

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Comparison of High Density Plasma Etching of MgO Thin Films Using Cl2, CH3OH and CH4 Plasmas