발행물
컨퍼런스
The 6th International Conference on Microelectronics and Plasma Technology
,
Nanometer-Size Patterning of TiN Thin Films Using Inductively Coupled Plasma of Cl2/C2F6/Ar
제14회 국제나노기술심포지엄 (Nano Korea 2016 symposium)
Comparison of etch characteristic of Palladium thin films in C, H, O containing gas mixtures
Nano Etching of TiN Thin Films with Nanometer-Sized Patterns Using Inductively Coupled Plasma Reactive Ion Etching
The 3rd USA International Conference on Surfaces, Coatings and NanoStructured Materials
Etch Characteristics of TiN Thin Films Masked with Nanometer-Sized Patterns
Inductively Coupled Plasma Reactive Ion Etching of Magnetic Tunnel Junction Stacks Using Various Non-Corrosive Gas mixtures