발행물
컨퍼런스
International Conference on Chemical, Metallurgy and Material Science Engineering (CMMSE-2015)
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The Effect of C, H and O Elements on Etching Ru Thin Films Using Inductively Coupled Plasma
2015년 한국화학공학회 춘계학술대회
Comparison of etch characteristics of Ru thin films using CH3OH/Ar and CH4/O2/Ar plasmas
High density plasma reactive ion etching of Co2MnSi thin films using a CH3OH/Ar gas mixture for magnetic random access memory applications
2015년 한국물리학회 춘계학술대회
알콜계 가스를 이용한 CoFeB 박막 식각 후 자력특성 변화 연구
Inductive coupled plasma reactive ion etching characteristics of Ta thin films for hard mask applications