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Inductively Coupled Plasma Reactive Ion Etching of Nanometer-Size Patterned Magnetic Tunnel Junction Stacks using C, H, O Containing Gases

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Inductively Coupled Plasma Reactive Ion Etching of Ru Thin Films Using CH4/O2/Ar Gas Mixture

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Etch Characteristics of Co2MnSi Thin Films in CH4/O2/Ar Plasmas

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Inductively Coupled Plasma Reactive Ion Etching of CoFeB Thin Films Using a CH3COOH/Ar Gas Mixture

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Characteristics of RF-sputtered CdS Buffer Layers for Cu(In,Ga)Se2 Solar Cells