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Effect of Non-Corrosive Gas Mixture on Properties of Etched CoFeB Alloys Using Inductively Coupled Plasma Reactive Ion Etching

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Study on Etch Characteristics of CoFeB Thin Films with Nanometer-Sized Patterns Using Pulse-Time Modulated Plasma

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Etch characteristics comparison of nanometer scale TiN hard masked MTJ stacks etched in a constant wave and pulse modulated plasma

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Investigation on etch characteristics of Palladium thin films using CH3COOH/Ar gas

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Anisotropic etching of CoFeB magnetic thin films in C2H5OH/Ar plasma