,

Etch Characteristics of Nanometer-scale Patterned Cu Thin Film Using Pulse modulated RF Source Plasma

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Inductively Coupled Plasma Reactive Ion Etching of Nanometer-scale Patterned Copper Thin Films using Alcohol-based Gases

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Etch characteristics of nanoscale patterned magnetic tunnel junction stacks using pulse-modulated RF source plasma

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Dry etching of copper thin films in high density plasma of organic acids

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Effect of Non-Corrosive Gas Mixture on Etching of Cu Thin Film Using Inductively Coupled Plasma Reactive Ion Etching