발행물
컨퍼런스
AVS ALD2021
2021
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Inherently Area-Selective Atomic Layer Deposition for High-K Dielectrics by Catalytic Local Activation
Effect of NH3 Flow on Electrical and Mechanical Properties of ALD TiN Thin Films
The 28th Korean Conference in Semiconductors
Low Temperature Growth of Wafer-scale 2D MoS2 Thin Films by Pulsed Metal-organic Chemical Vapor Deposition
Selective Area Growth of WSe2 on SiO2 Surface between Patterned Graphene Layers
Low-resistivity Molybdenum Nitride Thin Films Deposited by Atomic Layer Deposition Using a New Precursor