발행물
컨퍼런스
제29회 한국반도체학술대회
,
Inhibitor-Free Area-Selective Atomic Layer Deposition of SiO2 through Chemoselective Adsorption of an Aminodisilane Precursor on Oxide versus Nitride Substrates
Atomic Layer Deposited Li-based Memristor Devices for Neuromorphic Computing
N controlled Lithium Phosphorous Oxy-nitride(LiPON) Electrolyte Coating by LiPON:LiN ALD cycle ratio for Enhancing Ionic Conductivity
AreaSelective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide versus Nitride Selectivity
Li-Nb-O Family Deposited by Atomic Layer Deposition (ALD) for Artificial Synapse