Correlation of RF impedance with Ar plasma parameters in semiconductor etch equipment using inductively coupled plasma

Improvement of corrosion properties of plasma in an aluminum alloy 6061-T6 by phytic acid anodization temperature

The opposite pressure dependence of electron temperature with respect to O-2/Ar mixing ratio in an inductively coupled plasma

Experimental observation of the effect of electron attachment and detachment reactions on the electron energy distribution in an inductive oxygen discharge

Effect of the RF bias on the plasma density in an argon inductively coupled plasma

Electrical and plasma characterization of a hybrid plasma source combined with inductively coupled and capacitively coupled plasmas for O atom generation

Control of electron and ion density profiles via virtual ground position control in an inductively coupled plasma

A method for measuring plasma parameters and dielectric film thickness by analyzing transient voltages for deposition plasma processing monitoring

A method for measuring negative ion density distribution using harmonic currents in a low-pressure oxygen plasma

Effect of electron kinetics on plasma density in inductively coupled plasmas using a passive resonant antenna