발행물
컨퍼런스
208TH ECS MEETING
2005
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THE CHARACTERISTICS OF HAFNIUM-ALUMINATE FILMS GROWN BY ALD SYSTEM USING TEMAH, TMA AND O3
ATOMIC LAYER DEPOSITION 2005
THERMAL STABILITY OF ATOMIC LAYER DEPOSITED HF SILICATE FILMS USING HFCL4, TRIS SILANE AND H2O
THE CHARACTERISTICS OF HAFNIUM ALUMINATE FILMS GROWN BY ALD USING TEMAH, TMA AND O3
2004 KPS FALL MEETING
2004
DIFFERENCE OF PHASE-TRANSITION PROPERTIES OF GESBTE ALLOY FILMS: COMPOSITION DEPENDENCE
THERMAL STABILITY AND STRUCTURAL CHARACTERISTICS DEPENDING ON THE STACK STRUCTURE OF AL2O3 AND HFO2