2003

,

THE IMPROVED THERMAL STABILITY OF NIKEL SILICIDE FILMS BY NICKEL AND TANTALUM ALLOY

2003

,

EFFECTS OF GE ON THE ELECTRICAL PROPERTIES OF MOS CAPACITOR WITH POLY SI/HFO2 AND POLY SI0.4GE0.6/HF GATES STACK AFTER VARIOUS ANNEALING CONDITION

2003

,

PROPERTIES OF THE INTERFACIAL OXIDE AND HIGH-K DIELECTRICS IN THE HFO2/HF/SI STACK

2003

,

THE FORMATION OF THE INTERFATION OXIDE IN SPUTTERED HFO2/SI SYSTEM

2002

,

ULSI DEVICE에 적용을 위한 HIGH-K GATE OXIDE 박막의 연구