발행물
컨퍼런스
제9회 한국반도체학술대회
2002
,
CHARACTERISTICS OF ZRO2 THIN FILMS DEPOSITED BY REACTIVE DC MAGNETRON SPUTTERING METHOD UPON GATE ELECTRODES
B2H6 유량 증가에 따른 IN-SITU BORON DOPED POLY SI1-XGEX박막의 물리적?전기적 특성 연수
AM. VAC. SOC.
2001
A STUDY OF MOS CHARACTERISTICS OF REOXIDIZED HFO2 THIN FILM FOR GATE OXIDE APPLICATIONS
CHARACTERISTICS OF ZIRCONIUM OXIDE WITH DIFFERENT GATE ELECTRODES
ELECTRICAL AND PHYSICAL CHARACTERISTICS OF SPUTTERED HFO2 FILMS FOR ALTERNATIVE GATE DIELECTRICS