발행물
컨퍼런스
ECS PRiME
2020
,
Study of plasma treatments and planarization process for characteristics required for wafer-level Cu-to-Cu hybrid bonding
IEEE ECTC
Development of CMOS-compatible low temperature Cu bonding optimized by the response surface methodology
ENGE
Characterizations of copper nitride passivated surface for Cu bonding
KMAPS
Persistence analysis of copper nitride passivation for Cu bonding application
ISE
2019
Plasma process optimization for Cu bonding integration using the design of experiment technique