발행물
컨퍼런스
International Conference on Advanced Electromaterials
,
A simple strategy to improve ferroelectric performance of TiN/HZO/TiN via interface engineering
Low-resistivity molybdenum carbide thin films deposited by atomic layer deposition
The 28th edition of the IEEE International Interconnect Technology Conference (IEEE IITC)
2025
Atomic Layer Deposition of Ru Using New Zero-Oxidation State Ru precursor
Plasma-enhanced atomic layer deposition of MoCx thin films using a liquid Mo precursor
Effect of H2/N2 Ratio on Molybdenum Nitride Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition